Modified split structure particle accelerators

ABSTRACT

A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation application of U.S. patentapplication Ser. No. 17/276,446, filed Mar. 15, 2021 entitled MODIFIEDSPLIT STRUCTURE PARTICLE ACCELERATORS, which is the U.S. National Phaseunder 35 U.S.C. § 371 of International Application No.PCT/US2019/051748, filed Sep. 18, 2019, entitled MODIFIED SPLITSTRUCTURE PARTICLE ACCELERATORS, which claims the benefit of U.S.Provisional Application No. 62/734,971, filed Sep. 21, 2018, entitled“MODIFIED SPLIT STRUCTURE PARTICLE ACCELERATORS,” each of which ishereby incorporated by reference herein in its entirety and for allpurposes.

STATEMENT REGARDING FEDERALLY SPONSORED R&D

This invention was funded, in part, by government support under DOEGrant No. DE-SC0015722. The government has certain rights in theinvention.

BACKGROUND Field

The present disclosure relates to radiation technologies, in particularto beam generation and beam hardware.

SUMMARY

Modern radiation techniques tend to rely on bulky machinery with alimited scope of approaches for which radiation can be generated.Systems and methods disclosed herein address various challenges relatedto particle acceleration.

Described herein are various embodiments of linear accelerators(“linacs”), cyclic accelerators, and related components. A linac is adevice commonly used for external beam radiation generation and may beused in medical treatments. As will become clear from the followingdisclosure, producing an effective high-gradient linac structure canpresent a variety of technical challenges, which may be solved by manyof the novel features disclosed herein. While certain examples hereinrefer to a linac, those examples are equally applicable to other typesof particle accelerators (e.g., cyclic accelerators).

A particle accelerator can include a first waveguide portion and asecond waveguide portion. The first waveguide portion can include afirst plurality of cell portions and a first iris portion that isdisposed between two of the first plurality of cell portions. The firstiris portion can include a first portion of an aperture such that theaperture is configured to be disposed about a beam axis. The firstwaveguide portion can further include a first bonding surface. Thesecond waveguide portion can include a second plurality of cell portionsand a second iris portion that is disposed between two of the secondplurality of cell portions. The second iris portion can include a secondportion of the aperture. The second waveguide portion can include asecond bonding surface. In some embodiments, the first bonding surfaceis disposed adjacent the second bonding surface such that the first andsecond plurality of cell portions form a plurality of accelerating cellsand the first and second iris portions form an iris and an aperturewithin the iris. Other embodiments, including structures and methods forthe same, are described herein.

BRIEF DESCRIPTION OF THE DRAWINGS

Certain embodiments of the present disclosure will now be described, byway of example only, with reference to the accompanying drawings. Fromfigure to figure, the same or similar reference numerals are used todesignate similar components of an illustrated embodiment.

FIG. 1A shows a schematic of an example split linac.

FIG. 1B shows an exploded view of an example split linac.

FIG. 1C shows the split linac of FIG. 1B where the two split linacportions have been attached to one another.

FIG. 2 shows a detail view of an example split linac portion shown inFIG. 1B.

FIG. 3 shows another example of a split linac portion.

FIG. 4 shows a top view of another example of a split linac portion.

FIG. 5 shows an isometric view of a section of a split linac portion,including a section of an accelerating structure portion.

FIG. 6 shows a top view of an example section of a split linac portion.

FIG. 7 shows additional dimensions of an example split linac portion.

FIG. 8 shows an example split linac portion.

FIG. 9 shows an example split linac portion that can be attached to thesplit linac of FIG. 8 .

FIG. 10 shows a thermal performance heat map of an example split linac.

FIG. 11 shows an example accelerating structure.

FIG. 12A shows an isometric view of a portion of an accelerating cell.

FIG. 12B shows some additional dimensions of an example acceleratingcell.

FIG. 13 shows a schematic of an example RF waveguide network.

FIG. 14A shows an example linac head.

FIG. 14B shows another angle of the linac head, including the splitlinac portions.

FIG. 15A shows an example portion without a nose in the iris.

FIG. 15B shows example split linac portions having iris nose portion.

FIG. 16A shows an example of cross sections of portions of a split linacassembly operating in a traveling wave configuration.

FIG. 16B shows an example of cross sections of portions of a split linacassembly operating in a traveling wave configuration.

FIG. 17A shows an example side cell portion.

FIG. 17B shows an example side cell portion.

FIG. 17C shows an example side cell portion.

FIG. 18 shows an example of a split linac portion having a plurality ofside cell portions.

FIG. 19A shows an example heat map of a split linac having four coolingchannels.

FIG. 19B shows an example heat map of a split linac having six coolingchannels.

FIG. 20 shows an example acceleration gradient (in MV/m) along the beampath that may be achieved by a split linac described herein

DETAILED DESCRIPTION

In order to facilitate an understanding of the systems and methodsdiscussed herein, a number of terms are described below. The termsdescribed below, as well as other terms used herein, should be construedto include the provided descriptions, the ordinary and customary meaningof the terms, and/or any other implied meaning for the respective terms.Thus, the descriptions below do not limit the meaning of these terms,but only provide exemplary definitions.

Linear accelerator (“linac”): a device for accelerating particles suchas subatomic particles and/or ions where particles pass through eachcell only once. A linac is one example of a particle accelerator.

Cell element (or sometimes “cell”): a component of a particleaccelerator (e.g., a linear accelerator) that may include a cavity andan iris.

Accelerating cell: a type of cell through which particles areaccelerated.

Particles: subatomic or atomic elements, such as electrons or hadrons,that can be accelerated in a particle accelerator.

Phase velocity: rate at which the phase of an electromagnetic wavepropagates. The velocity may be positive or negative.

Beam velocity: average rate at which particles within a beam ofparticles are traveling over a small distance.

Overview of Example Embodiments

Particle accelerators, such as linear accelerators, can be used in avariety of applications, such as medical equipment, X-ray detectionsystems, radiation detection systems, irradiation, materialdiscrimination, cargo inspection, nuclear forensics, and scientificresearch, among many other applications. Other accelerators may becyclic rather than linear. Linear and cyclic accelerators are generallyconstructed using a plurality of individually manufactured (e.g.,milled) cell elements that are then attached to each other using somesort of bonding technique, such as welding. Due to the individual natureof each cell and the subsequent assembly required, frequently theseaccelerators require tuning and testing after final assembly to fitperformance specifications.

Cancer is a global problem, accounting for almost 13% of all deathsworldwide and is one of the fastest growing diseases on earth. Radiationtherapy by external beams, as primary treatment or in conjunction withchemotherapy, surgery or other modalities, is used to treat over 60% ofcancer patients and used in nearly half of the curative cases. Indeveloped countries, radiation therapy is widely used. However, inlow-income and middle-income countries (LMIC), there is a largeunderserved population, with technology per capita 2 or more orders ofmagnitude lower than in the US market. LMIC are home to 85% of theworld's population, yet they have only around 4,400 radiotherapysystems, an estimated shortage of approximately 5,000 systems. Many LMICstill utilize outdated Cobalt-60 teletherapy machines, which result inexcessive normal tissue dose, present safety hazards, and are at riskfor diversion for terrorist purposes in radiological dispersal devices(aka “dirty bombs”).

The barriers to wider adoption and availability of modern linearaccelerator technology in LMIC are primarily due to the high capital andoperating costs, requirement for highly-trained service technicians, andhigh-level of sophistication needed for treatment planning and delivery.In addition, state-of-the-art medical linacs have very high peak andaverage electrical draws, and require stable, reliable power that isoften unavailable in LMIC.

A novel medical linac system can be designed from the ground up to beeasy-to-use, simple-in-operation, robust, reliable and efficient.

Radiation therapy is a staple modality in cancer management. Byexploiting the differential radiosensitivity between the cancer andnormal tissues, radiotherapy can be used to cure cancers including headand neck, breast, prostate and early stage lung cancer and prolong thelife of many other types of cancer patients.

The worldwide standard for cancer care is 1 radiation therapy machinefor every 100,000 people. In Africa, 29 countries have no machines,Senegal has 1 machine for 12 million people, Ghana and South Africa have1 machine for 1 million people each, and Ethiopia has 1 machine for 70million people. The lack of access to radiotherapy contributes to 4million premature cancer deaths annually.

Both Cobolt-60 and linacs are used to deliver external beam therapy.With the exception of highly specialized machines such as GammaKnife,Co-60 units have been phased out of the developed world, but theirreplacement by linacs in LMIC has been slow.

There are many technical reasons preventing medical linacs from beingmore widely available, particularly in the developing world. Suchtechnical reasons include, for example, unstable electrical power,environmental control, and need for filtered, low-conductivity water forcooling.

Certain Example Linac Designs

The design of a linac RF accelerating structure can be improved withparticular attention to minimizing the power consumption and reducingfabrication costs. In certain embodiments, the accelerator mayadvantageously be used in X-band (around 9.3 GHz), instead of the morecommonly used S-band (3 GHz). Operation at higher frequency has severaladvantages compared to lower frequencies, as the effective shuntimpedance (which defines power transfer efficiency to the beam) scalesas f^(1/2) and dissipated power per unit length as 1/f^(1/2). The lowerQ of X-band structures also allows the filling time of the cavity to beshorter, reducing the amount of time during which power goes unused.Thus, normal-conducting cavities operating at high frequencies requiresignificantly less power than those operating at low frequencies.

A novel “split-linac” manufacturing approach can be used. Instead ofmachining dozens of precise individual cells, which may then need to bebrazed together and tuned, the RF structure can consist, for example, ofjust two blocks of copper with a pattern machined into the surface, inwhich case the two halves can be then joined together through an ovenbrazing (or other) process. This allows greater precision to be achievedat lower cost by reducing part count and machinist touch time.

In one example, a linac may be engineered using a CAD model withdimensions obtained through iterative RF and design for manufacturing(DFM) modifications to arrive at the final RF volume. Consideration maybe given to realistic cutting tool geometries and challenging access tothe undercut features of the nose cones.

A preliminary analysis indicates the cost of the conventional sidecoupled linac machining (e.g., 19 cells, each composed of two halfcells) versus the split linac version (e.g., where the RF structureconsists of only two parts). Due to the significantly reduced number ofparts, and the resulting reduction in machinist setup time, themachining cost of the split structure was dramatically lower, even by afactor of 15. The split design also reduces costs for othermanufacturing steps, such as dimensional inspection, cleaning, brazingand tuning. The cost for the split-linac beam centerline may be 70%cheaper compared to alternatives.

Example RF and Beam Dynamics Design

In one embodiment, X-band RF structures can be manufactured as a 6 MeVlinac structure. The linac may comprise, for example, a set of bunchingcells and a set of accelerating cells, such as, for example, 3 bunchingand 16 accelerating side-coupled cells, operating in standing waveregime, as shown below. Example parameters of such a linac aresummarized in the table below.

TABLE 1 Calculated parameters of an example X-band medical linac Peak RFpower 1.8 MW Measured shunt impedance 130 MΩ/m Cavity coupling 1.65 Peak beam energy 6.02 MeV Peak beam current 110.9 mA Duty factor 0.0008Pulse flat top 75% Average beam current 66.5 μA Dose @ 1 m 725 cGy/minDose @ 0.8 m 1130 cGy/min

A number of example magnetrons could be used that are listed in Table 2.Of these example magnetrons, L-3 6170 has the highest available peakpower, while CPI VMX3100HP has the highest average power.

TABLE 2 Example X-band magnetrons Magnetron model MM7637 VMX3100HP 6170Manufacturer NJR CPI L-3 Operating Frequency, MHz 9300 9300 9300 Peak RFinput power, MW 1.6 1.5 1.8 Available RF power, MW 1.5 1.4 1.7 DutyCycle 0.00088 0.0018 0.0008 Pulse Length, μs 4.0 5.5 4.0 Flat Top(Estimated), μs 3.5 5.0 3.5 Required peak current, mA 90 45 100 (750cGy/min at 1 m for 6 MeV)

In some embodiment, the shunt impedance can be increased by reducing thebeam aperture size. In this case, the electric field becomes stronger onthe axis and the beam acquires more energy with the same RF losses. Onthe other hand, the beam acceptance may be reduced dramatically and thebeam transmission may drop. Also, such structure may have much worsevacuum conductivity and thus cause serious operational problems. Theinteraction between various linac parameters and the aperture size issummarized in

Table 3. Two example cases were considered: optimizing the linac lengthfor the available peak power and maintaining the length for thereference linac (19 cells). The results suggest that a reduced or evenminimal length may be achieved with CPI magnetron while a reduced oroptimized power consumption may be achieved with L-3 magnetron. Forfurther optimization, we will only consider this magnetron.

TABLE 3 Linac parameters as a function on beam aperture for some examplemagnetrons Aperture, mm 0.8 1.4 2.0 Q-factor 9385 9117 8826 Shuntimpedance, MOhm/m 183.4 166.7 148.7 Structure length (NJR), cm 21.2 23.426.2 Required power for 19 cells, kW 1.17 1.23 1.32 Structure length(CPI), cm 17.8 19.5 22.0 Required power for 19 cells, kW 1.82 1.94 2.12Structure length (L-3), cm 18.7 20.5 23.1 Required power for 19 cells,kW 1.10 1.15 1.23

Several types of accelerating structures are disclosed herein, some ofwhich are listed below.

-   -   a) Side-coupled structure (SCL). The structures (a-e) operate        standing wave (SW) architectures, which may be more efficient        than travelling wave (TW) structures for short low-current        linacs, since all input RF power may be used;    -   b) Biperiodic on-axis couple structure (BAS). This structure can        have smaller transverse dimensions since the coupling cells may        be located between the accelerating cells. Larger dimensions of        the coupling holes compared to SCL may allow for better mode        stability and/or simpler tuning mechanism. In some        configurations, the BAS structure may have lower efficiency        compared to the SCL architectures due to one or more coupling        cells having zero field located along the accelerating path;    -   c) Split pi-mode disk-loaded structure (s-DLS SW). Split pi-mode        and/or disk-loaded structures can be made from two halves and        thus may be much easier and cheaper to machine. Also, such        structures may not require time-consuming and expensive        post-brazing tuning process since their dimensions may be easily        adjusted during the pre-brazing cold tests. The simplest DLS        structure that can be fabricated, though, has no noses (poor        electric field concentration and no RF beam focusing), and        operates in pi-mode, which for 19 cells has miniscule mode        separation;    -   d) A split pi-mode structure with small machinable noses (s-DLSn        SW), which improves the on-axis field concentration, and thus        shunt impedance;    -   e) Split SCL (s-SCL) structure that has all the advantages of        split structure and the high efficiency of the SCL structure;    -   f) Travelling wave DLS (DLS TW). TW structures are typically        used for high current or high energy linacs, since they don't        have a mode separation issue thanks to the continuous dispersion        curve, and can be made very long. Also, longer structures have        higher full shunt impedance (Rsh*L), which can result is lower        power requirement (since, P˜V²/Rsh*L). Unlike SW structures,        where the filling time may depend on the Q-factor, in TW        structure it can depend on the length and group velocity        (vgr*L), and may be smaller than in SW. On the other hand, the        minimum aperture size can be defined by the minimal group        velocity and may be larger than for SW structure, which reduces        the shunt impedance;    -   g) Split TW DLS (s-DLS TW) can provide fabrication simplicity;        and    -   h) Backward TW (BTW) structure can avoid or reduce the problem        of the minimal aperture, since the coupling between cells can be        accomplished by means of magnetic field via coupling holes,        unlike DLS where the cells may be coupled by electric fields        through the aperture. In BTW the field travels from the end of        the structure towards the beginning.

The parameters of above-mentioned structures are compared in Table 4.Certain conclusions of these optimizations include:

-   -   Average power losses are mostly defined by the magnetron and the        L-3 6170 provides optimal length and power savings;    -   The average power can be traded off with the structure length.        In SW structures, a good way to increase shunt impedance and        reduce the required power (by only ˜10%) is to make the aperture        smaller;    -   Open pi-mode SW structures with small apertures have lower shunt        impedance compared to traditional structures;    -   Open SCL is possible for the open SW structure. This type of        structure can be a good option due to machining advantages;    -   Constant impedance TW DLS can have comparable parameters to SW        linac but may require solenoid in some configurations;    -   Backward wave constant gradient structures can potentially        improve either power losses or the length by 10% comparing to SW        structure but cannot be made split.

TABLE 4 Example linac parameters of different types of acceleratingstructures. Shunt Filling Structure Required impedance, time, lengthpower (19 Structure MΩ/m ns (L-3), cm cells), kW SCL 148.7 453 23.1 1.23BAS 125.5 378 27.4 1.36 s-DLS SW 124.3 SW 564 27.6 1.37 s-DLSn 138.8 53924.8 1.28 SW s-SCL 125.5 498 27.4 1.36 DLS TW 168.5 357 22.8 1.27 s-DLSTW 136.6 222 28.0 1.37 BTW 186.8 177 21.5 1.13

Based in these simulations, a split side-coupled structure (s-SCL) maybe used because it can have comparable parameters to the traditionalstructure and may be easier for fabrication, assembly and tuning(discussed below).

During the RF design phase, consideration was given to realistic cuttingtool geometries and challenging access to the undercut features of thenose cones. The cutting tool depth to diameter ratio may be kept below 2to promote tool rigidity useable for high surface finishes and surfacefeature dimensional conformance. Several design modifications may bemade compared to the direct SCL structure adaptation presented in thefigure below in order to allow feasible fabrication, as shown below:

-   -   The cylindrical shape of the coupling cell may be changed to the        rectangular;    -   The corner blending radius may be increased;    -   Sharp coupling hole edge may be replaced with the oval        conjunction.

Similarly, the bunching cells with the reduced phase velocity(β_(ph)=v/c) may be designed with cell parameters summarized in Table 5.

TABLE 5 s-SCL cell parameters Phase β 0.65 0.999 Cell length, cm 1.0481.61 Shunt impedance, MΩ/m 89.4 124.3 Coupling between cells, % 3.3 2.5Mode separation, MHz ~8 ~6 Q-factor 6692 9224

Based on these parameters, the preliminary beam dynamics analysis wasperformed in Parmela to demonstrate the feasibility of such linacapproach (mostly, in terms of beam focusing). The concept of theaccelerator was similar to the conventional X-band linac produced byRadiaBeam (three bunching and 16 accelerating cells). However, here allbunching cells were made similar (with β=0.65) to simplify fabrication.This became possible since the linac is planned to operate in a singleenergy regime. An example field profile in the bunching cells is shownbelow. The same figure demonstrates an example simulated beam energyspectrum at the end of the linac. The simulated linac parameters arepresented in Table 6, and demonstrate features of the s-SCL structure.

TABLE 6 Simulated s-SCL linac parameters Energy 5.96 MeV Peak current118 mA Gun current 283 mA Transmission 42% E-field gradient 28 MV/m

Cooling features may be included therein, such as 5 mm diameter waterchannels in each element (e.g., half) with a typical heat transfercoefficient for the cooling water of 15 kW/m²/K. RF losses may beconsidered equally distributed (e.g., 567 W per half). Examplepreliminary simulation results for various number of channels are shownbelow and reasonable cooling may be achieved with 6 channels per half.

Engineering and Fabrication of Certain Embodiments

To significantly reduce the linac costs, a novel “split-linac”manufacturing approach may be used. Instead of machining dozens ofprecise individual cells, which are generally then be attached (e.g.,brazed) together and tuned, the RF structure comprises (e.g., consistsof) a plurality of (e.g., two) blocks of metal (e.g., copper) with apattern machined into the surface. The blocks (e.g., two halves) arethen joined together through an oven brazing process. This allowsgreater precision to be achieved at lower cost by reducing part countand machinist touch time as detailed further herein.

The design and size of configurations described herein can allowmultiple parts to be manufactured simultaneously on a single machinesetup that can reduce the average touch time per block (e.g., half).

The split structure fabrication process can also eliminate and/or reducethe time-consuming step of tuning the blocks. Currently, the deviationsfrom the designed dimensions in the final assembly are the result ofmachining feature deviations and variances in braze material thicknessesin between the cells. The machining accuracy can be high enough tosignificantly reduce tuning time. Certain surface profiles within thestructures may be kept to +/−15 microns along with corresponding profilepositions, and in some configurations within +/−10 microns. This levelof accuracy can result in high quality RF performance.

Advantageously, a split linear or cyclic accelerator can bemanufactured. The split accelerator can include two sections that aresubsequently joined. Each section can include a portion (e.g., half) ofa one or more cells such that once the sections are joined together, theone or more cells are complete. In contrast with the acceleratorsdescribed above where individual, complete cell components aremanufactured and then assembled to create the accelerator, a splitaccelerator architecture allows for the construction or manufacture offewer elements or portions, such as two halves. Each portion can betuned during the manufacturing process so that little or no tuning isrequired after the final assembly. Because in some embodiments thespacing, sizing, proportions, and other dimensions of subsequent cellportions is at least partially already determined (e.g., since the cellportions are milled from a common block of metal), tuning requirementsmay be reduced or eliminated after manufacture of each acceleratorportion. The reduction in the number of individual components that needto be manufactured and/or tuned can result in savings of time and costin manufacturing and/or tuning.

Various embodiments disclosed herein employ a novel “split-linac”manufacturing approach that is highly compatible with micromachining.The term “split linac” may be used throughout, but the functionality maybe applied to cyclic accelerators as well. Instead of machining dozensof precise individual cells, which often must then me brazed togetherand tuned, the accelerating structure may comprise two blocks of metal(e.g., copper) with a pattern micro-machined into the surface. The twoblocks may then be joined together (e.g., welded, brazed, or diffusionbonded). This allows greater precision to be achieved at lower cost,reduces part count, eliminates issues with braze materials changing thedimensions of the cavities, and potentially eliminates the need fortuning.

Below are several additional examples of linac structures andmanufacturing processes. Any of the details noted above, e.g., relatedto developments and/or optimizations identified through variousexperiments, may be applicable in various combinations in the examplesprovided below.

Split Structure Particle Accelerators

A compact accelerating structure can comprise two milled halves, capableof producing an energetic (e.g., between about 0.1 MeV to 10 MeV)electron beam and converting the beam to X-ray radiation. Theaccelerating structure may have compact dimensions that can utilize anX- and/or K-band (including Ku- and Ka-sub-bands) magnetron. An S-and/or C-band wave generator can also be used. A lower-cost structure isachieved by reducing the number of elements to two pieces (comprising,for example, copper) with micro-milled accelerating cells.

The structures relate to linear accelerators and more particularly tocompact split-structure accelerators that operate at microwavefrequencies to drive an accelerating wave through the structure, whichcomprises two manufactured (e.g., micro-machined, electrical dischargemachined (EDM)) portions of a diaphragmed waveguide to enable low-costproduction. The structures may also be used in cyclic accelerators, suchas circular accelerators. For example, the split accelerator may beapplied to microtrons.

Such compact accelerating structures can be used in a variety ofcontexts, such as X-ray production or electron production. X-ray sourcesare used in a wide range of applications from cancer therapy to oilexploration. Some of the applications of these sources includenon-intrusive inspection and active interrogation systems, such asmethods for nuclear detection, material recognition, and industrialradiography. The structures may also be used in medical applications,material or cargo inspection (e.g., using X-ray backscatter) or othercomputed tomography applications.

A cheap and compact X-ray source can utilize radioactive materials toproduce X-rays. Replacement of radioisotopes used in these applicationswith a safer, electronic alternative enhances the above-mentionedmethods with new capabilities, and reduces the risk of radioisotopesbeing used in radiological dispersal devices.

Particle accelerators can be used as X-ray sources by utilizing aBremsstrahlung effect of X-ray radiation production by the decelerationof an electron by an atomic nucleus. However, conventional acceleratorscannot compete with radioisotope sources in terms of compactness andcost. X-ray tubes can be used as a compact source of X-rays, but for theenergies of 0.1-1 MeV that radioisotopes are mostly used they are stillvery bulky and expensive.

It is known that the volume of the accelerating structure scalesinversely with the square of the operation frequency f (e.g., it mayscale approximately with 1/f^(5/2)), and by building an accelerator thatoperates at frequencies higher than the conventional linacs do (>3 GHz),it is possible to reduce the dimensions of the X-rays source to aportable size where it can compete with radioisotope sources. However,operation at such high frequencies has several limiting factors:availability of power sources, high dimensional sensitivity and extremecomplexity of tuning and operational accelerating wave stability, andhigh price of accelerating waveguide fabrication with conventionalseparate cell technology.

The split linac design can provide a method of achieving a reduced costof ultra-high gradient structures for high-energy physics acceleratorsas well. Split linacs can be micro-machined or molded. To machine thelinac, an electrical discharge machining (EDM) process or othermachining process may be used to achieve a dimensional tolerance of lessthan about 100 μm and may be less. For example, the techniques describedherein may achieve a surface roughness of less than 5 μm and in someembodiments about 1 μm. Additionally or alternatively, a surfaceroughness of less than 1 μm may be achieved, such as about 200 nm.

Split linac designs described herein may be used at higher frequenciesto both reduce the size of the linac and to reduce the manufacturingcosts. Electromagnetic wave sources, such as magnetrons, can be used toprovide K-band (e.g., Ku-band and/or Ka-band), X-band, and/or C-bandfrequencies. The split linac approach changes the paradigm ofmanufacturing and opens up the possibility of using modernmicromachining approaches to achieve the required tolerances at very lowcost.

Various embodiments can include a Ku-band (e.g., around 16 GHz) RF powermagnetron. Ku-band RF can allow reduction in the size of X-bandaccelerator by about 44%. Ku-band magnetrons are relatively small andinexpensive and may require lower-voltages from the modulator. TheKu-band magnetron can produce up to 250 kW or more. In some cases, andwithout being limited by theory, a 60 kW peak power may be enough toprovide 1 MeV energy to the electron beam in 20 cm length. A 1 kW peakpower may be required for every 1 mA of accelerated current.

Some examples of uses of accelerators is in various detection systems,such as detectors for radioactive materials. Approximately 5,000 devicescontaining 55,000 high-activity radionuclide sources are in use in theUnited States today, in applications ranging from cancer therapy to oilexploration. Measurement of radioactive materials can be used as a toolto safeguard nuclear facilities. Enrichment plants can represent one ofthe most sensitive parts of the nuclear fuel cycle, yet safeguards atenrichment plants still remain a challenge for the International AtomicEnergy Agency (IAEA). IAEA and the United States Department of Energy(DOE) have identified the replacement of radioactive sources withalternative technologies as a priority due to the risk of accidents anddiversion by terrorists for use in Radiological Dispersal Devices.

Turning now to the figures, various embodiments and variations of thoseembodiments will now be disclosed. FIG. 1A shows a schematic of anexample split linac 104. The split linac 104 may include a first splitlinac portion 104 a and a second split linac portion 104 b. Each splitlinac portion 104 a, 104 b may include corresponding acceleratingstructure portions 120 a, 120 b. The accelerating structure portions 120a, 120 b may include various features as described herein. For example,each of the accelerating structure portions 120 a, 120 b may includecorresponding cell portions or other aspects that may cooperate with oneanother in providing linac functionality. As shown, the split linacportion 104 a may be disposed adjacent the split linac portion 104 b.Additionally or alternatively, the accelerating structure portion 120 amay be in optical communication with the accelerating structure portion120 b to provide linac functionality as described herein.

FIG. 1B shows an exploded view of an example split linac 104. The splitlinac 104 can include first and second split linac portions 104 a, 104 bas shown. One or more of the first and second split linac portions 104a, 104 b may include a corresponding first linac entrance apertureportion 112 a and/or a corresponding linac entrance aperture portion 112b (not shown in FIG. 1B). Additionally or alternatively, correspondingfirst and second linac exit aperture portions 116 a, 116 b may beincluded in the first and second split linac portions 104 a, 104 b. Whenthe first and second split linac portions 104 a, 104 b are joined, thefirst and second linac entrance aperture portions 112 a, 112 b can forma linac entrance aperture 112. Additionally or alternatively, the linacexit aperture portions 116 a, 116 b can form a linac exit aperture 116.The linac entrance aperture 112 and/or the linac exit aperture 116 candefine a beam axis 108. The split linac 104 can be configured to receivea beam of particles (e.g., protons, electrons, etc.) along the beam axis108. The split linac 104 can be configured to receive the beam ofparticles into the linac entrance aperture 112 and to allow the beam toexit via the beam axis 108. As shown, an accelerating structure portion120 a may be included within the split linac portion 104 a.

Each split linac portion 104 a, 104 b may include corresponding firstand second RF input coupling element portions 124 a, 124 b and/or firstand second RF output coupling element portions 128 a, 128 b. Thecombination of the first and second RF input coupling element portion124 a, 124 b can form an RF input coupling element 124. Similarly, thecombination of the first and second RF output coupling element portion128 a, 128 b can form an RF output coupling element 128. The RF inputcoupling element 124 and/or the RF output coupling element 128 may bereferred to as RF coupling cells.

The RF coupling cells can be configured to incouple/outcouple Ku-band RFpower. Other wavelengths (e.g., X-band, S-band, etc.) are possible.Generally, the RF power is fed (e.g., from a power source such as amagnetron) into the split linac 104 via the RF input coupling element124. In some embodiments, such as those involving side-coupled cells, asingle coupling element (e.g., the RF input coupling element 124) isused. In other embodiments, such as certain traveling wave embodiments,the split linac 104 can outcouple excess RF power via the RF outputcoupling element 128.

FIG. 1C shows the split linac 104 of FIG. 1B where the two split linacportions 104 a, 104 b have been attached to one another. The split linacportions 104 a, 104 b may be attached in any number of ways. Forexample, the two split linac portions 104 a, 104 b may be welded,brazed, diffusion bonded, or adhered using another technique. Theattachment between the split linac portion 104 a and the split linacportion 104 b may be along at least a portion of a seam 130. The splitlinac portion 104 a may have an attachment surface and the split linacportion 104 b may have a corresponding attachment surface, which arebrought adjacent to one another for final attachment. One or both of thesplit linac portions 104 a, 104 b may include copper (e.g., pure copper,a copper alloy copper or other metal (e.g., stainless steel, aluminum,niobium, etc.). The complete split linac 104 may have a substantiallyregular shape. For example, the split linac 104 may be substantially arectangular prism, as shown in FIG. 1C.

The split linac 104 can be used in a variety of applications that maynecessitate different lengths and/or other dimensions. For example, thelength of the split linac 104 (as measured along the beam axis) may bebetween 5 cm and 150 cm, between about 10 cm and 80 cm, and in someembodiments is about 30 cm. Longer linac structures may require higherRF power. The split linac 104 may operate at an energy of between about4 MeV and 9 MeV and in some embodiments operates at an energy of about 6MEV.

The split linac 104 may operate using a standing wave (SW) setup.However, in some embodiments, a traveling wave (TW) configuration may beused. The split linac 104 can operate on a variety of frequencies. Thesplit linac 104 may be configured to operate in either π/2-mode or π-,but other configurations may be possible in TW regime (e.g., about2π/3-mode). The split linac 104 may be configured to receive an energyof less than about 10 MeV. The frequency of the RF power may be greaterthan about 6 GHz, greater than about 9 GHz, and in some embodiments maybe greater than about 15 GHz. In some embodiments, the operationfrequency may be between about 3 GHz and 300 GHz, and between about 9GHz and 110 GHz in some embodiments. The energy may be received from anenergy source described herein.

While various examples of a “split linac” are discussed herein with twosplit linac portions (e.g., 104 a, 104 b), in other embodiments a splitlinac may include additional portions. For example, a split linac mayinclude three, four, or more split linac portions configured to bejoined to form a linac. For example, in one embodiment, fourquarter-portion linacs, each comprising substantially half of one of thesplit linacs 104 a or 104 b, can be joined to form a linac.

FIG. 2 shows a detail view of an example split linac portion 104 a shownin FIG. 1B. The split linac portion 104 a can include the linac entranceaperture portion 112 a, the linac exit aperture portion 116 a, the RFinput coupling element portion 124 a, and the RF output coupling elementportion 128 a as described herein. The accelerating structure portion120 a may include a recessed portion from an attachment surface(indicated by the hashed area). The accelerating structure portion 120 acan include one or more accelerating cell portions 140 a. Between orwithin each accelerating cell portion 140 a, a cell iris portion 136 maybe disposed. The cell iris portion 136 may include a raised portionrelative to neighboring one or more accelerating cell portions 140 a.The a split linac portion 104 a having a substantially semi-cylindricalinternal surface with a plurality of ridges. Each of the plurality ofridges can be spaced apart along the beam axis 108 of the split linacportion 104 a. Each of the plurality of ridges can extend radially fromthe semi-cylindrical internal surface. The attachment surface (e.g.,bonding surface) may be included outside a region of the acceleratingstructure portion 120 a. The second split linac portion 104 b may haveone or more features of the split linac portion 104 a such that thesplit linac portion 104 a and the split linac portion 104 b may beattached to one another. In some embodiments, the split linac portion104 a and the split linac portion 104 b exhibit partial or completepoint symmetry (e.g., about a center point of the accelerating structureportion 120 a and/or the accelerating structure portion 120 b).

Each of the accelerating cell portions 140 a can include a hollow spacehaving the shape of a semi-cylinder or disk shape. The shape may beelliptical (e.g., ellipsoid, ovoid) or some other rounded shape. Theportions removed to form the accelerating structure portions 120 a canbe removed radially from the beam axis 108. A length of eachaccelerating cell portion 140 a may be measured between neighboring celliris portions 136 a. In some cases, the length of each accelerating cellportion 140 a may be measured such that a given cell iris portion 136 ais disposed at a center of the length.

Each of the cell iris portions 136 s can include a correspondingplurality of iris aperture portions 144 a therein. Each of the irisaperture portions 144 a can be formed (e.g., milled, molded) to form asemi-circular space in the corresponding cell iris portion 136 a whenviewed along the beam axis 108. Accordingly, the portion removed foreach iris aperture portion 144 a can be in the shape of a disk orsemi-cylinder. Each cell iris portion 136 a can include a smoothsurface.

The RF coupling element portions 124 a, 128 a can each have a narrowestportion nearest the accelerating structure portion 120 a (e.g., radiallyproximal of the accelerating structure portion 120 a) and an expandedportion or flared portion radially distal of the accelerating structureportion 120 a.

The formation of the resulting split linac 104 can include taking asplit linac portion 104 a and a corresponding split linac portion 104 bsuch that a spacing between respective pairs of adjacent ridges of theplurality of ridges of the split linac portion 104 a along the beam axis108 is approximately equal to a spacing between corresponding pairs ofadjacent ridges of the plurality of ridges of the split linac portion104 b along the beam axis. The attachment surface of the split linacportion 104 a and the corresponding attachment surface of the splitlinac portion 104 b can be attached (e.g., bonded) together to define ajoined structure. The structure can have a substantially cylindricalinternal surface with corresponding ridges that form a plurality ofaccelerating cells 140. Each of the accelerating cell 140 can have acentral aperture that is configured to allow a beam of charged particlesto travel therethrough along the beam axis 108 extending through irisaperture 144 of each of the plurality of accelerating cells. Each of thesplit linac portion 104 a and the split linac portion 104 b can havecorresponding RF input coupling element portion 124 a and RF inputcoupling element portion 124 b that form a resulting RF input couplingelement 124 when finalized. Similarly, a RF output coupling elementportion 128 a and a RF output coupling element portion 128 b can form aresulting RF output coupling element 128. The plurality of acceleratingcells 140 can be in optical and/or fluid communication with the RF inputcoupling element 124 and/or the RF output coupling element 128. The RFinput coupling element 124 can receive electromagnetic waves from apower source (e.g., a magnetron). The RF input coupling element 124 maybe in communication with a first accelerating cell 140 and/or the RFoutput coupling element 128 may be in communication with a lastaccelerating cell 140. Each of the plurality of accelerating cells 140may be configured to accelerate a beam of charged particles to avelocity of 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, or less than1.0 times the speed of light, any value therebetween or within any rangetherein. The accelerating structure portion 120 a can include one ormore pluralities of accelerating cells 140. Each of the pluralities ofaccelerating cells 140 can be configured for accelerating particles at adifferent velocity or range of velocities relative to neighboring aneighboring plurality of accelerating cells 140. For example, subsequentpluralities of cells can be configured for accelerating the beam ofparticles at increasingly higher velocities. For more details, see, forexample, FIG. 3 .

FIG. 3 shows another example of a split linac portion 104 a. The splitlinac portion 104 a shown in FIG. 3 does not include an acceleratingstructure portion 120 a, but such an accelerating structure portion 120a can be included. As shown, a beam input 152 can represent an input fora beam of particles. A corresponding beam output 156 can represent anoutput of the beam of particles. The beam input 152 and the beam output156 can be aligned with corresponding linac entrance aperture portions112 a, 112 b and/or with corresponding linac exit aperture portion 116a, 116 b. An RF input 160 can be via the RF input coupling element 124and/or an RF output 164 can be via the RF output coupling element 128.

The plurality of accelerating cell portions 140 a can include one ormore cell types 141 a, 141 b, 141 c, 141 d. The first cell type 141 acan be configured to accelerate particles at a velocity (which mayroughly correspond to a phase velocity of the RF waves) of between aboutβ=0.2 and β=0.9, between about β=0.3 and β=0.8, and in some embodimentsat about β=0.6. The second cell type 141 b can be configured toaccelerate particles at a velocity of between about β=0.2 and β=1.0,between about β=0.3 and β=0.9, and in some embodiments at about β=0.65.The third cell type 141 c can be configured to accelerate particles at avelocity of between about β=0.3 and β=1.0, between about β=0.5 andβ=0.95, and in some embodiments at about β=0.7. Additional or fewer celltypes may be included. In some embodiments, cells of the various typesmay be arranged in different quantities and/or orders than illustrated.In some embodiments, subsequent cell types are configured to accelerateparticles at increasingly higher velocities. For example, in someembodiments, each cell of the first cell type 141 a is configured toaccelerate cells at about β=0.6, each cell of the second cell type 141 bis configured to accelerate cells at about β=0.65, each cell of thethird cell type 141 c is configured to accelerate cells at about β=0.7.Other configurations are also possible, such as cells with generallyincreasing β that have one or more higher-β initial cells (e.g.,β₁=0.65, β_(2-n)>0.45, where the subscript refers to the cell number,with n being the total number of cells in the accelerator). The symbolbeta (“β”) can represent a ratio of the speed of light. For example,β=0.4 indicates a speed of 0.4 times the speed of light.

FIG. 4 shows a top view of another example of a split linac portion 104a. Throughout this description, while detail has been provided for asplit linac portion 104 a, a corresponding split linac portion 104 b maysimilarly be constructed to form a resulting split linac 104. As shownin FIG. 4 , each cell type 141 a, 141 b, 141 c, 141 d can have differentphysical parameters, such as those shown (though the cells may not bedrawn to scale). An aspect ratio can be defined as a ratio of the celldiameter 202 to the cell length 206. The aspect ratio for cells may be0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 1.2, 1.4, 1.6, 1.8, 2,2.5, 3, 3.5, 4, 4.5, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18,19, 20, any value therein, or fall within any range within any valuetherein. For example, in some embodiments, the aspect ratio may be about1, 1.5, 8, or about 11, though other values are possible. The aspectratio may decrease for subsequent cell types 141 a, 141 b, 141 c, 141 dalong the beam axis 108.

The number of accelerating cells 140 of each cell type 141 a, 141 b, 141c, 141 d may vary for each cell type. For example, the split linac 104may include a greater number of lower-beta cells (e.g., acceleratingcells 140 configured to accelerate particles at a relatively lowervelocity than other accelerating cells 140) than higher-beta cells. Thefirst cell type 141 a can include between one and twenty cells, betweentwo and fifteen cells, and in some embodiments (e.g., as shown) includessix cells. The second cell type 141 b can include between one and thirtycells, between two and twenty cells, and in some embodiments (e.g., asshown) includes eight cells. In some embodiments the second cell type141 b can include between five and fifteen cells The third cell type 141c can include between one and fifteen cells, between two and twelvecells, and in some embodiments (e.g., as shown) includes four cells. Thefourth cell type 141 d can include between one and twelve cells, betweentwo and ten cells, and in some embodiments (e.g., as shown) includes twocells. Additional or fewer cells 140 within each cell type may beincluded. The number of total cell types can be equal to or less thanthe total number of cells 140. For example, in some embodiments, eachcell in the split linac 104 is unique and/or constitutes its own celltype. In some embodiments, the number of cell types is equal to one(e.g., all the cells are identical). Any number of cell typestherebetween are possible. The split linac 104 can include between 1 and120 accelerating cells 140, between 5 and 60 cells, and in someembodiments includes, for example, about 6, 8, 20, or 35 cells. In someembodiments, an initial accelerating cell 140 has a lower beta than afinal accelerating cell 140. The beta value of groups of cells orindividual cells may generally increase along the optical axis. Forexample, each cell may be configured to accelerate particles at a highervelocity (e.g., the cells have a higher beta) than each preceding cell.Other configurations are possible, such as others disclosed herein.

FIG. 5 shows an isometric view of a section of a split linac portion 104a, including a section of an accelerating structure portion 120 a. FIG.6 shows a top view of an example section of a split linac portion 104 a.Various dimensions are indicated. For example, a cell length 206 isshown as measured along the beam axis 108 such that the cell iris 136 isdisposed at a midpoint along the cell length 206. The cell length 206may be determined in part by the velocity of the beam of particles(which may be symbolized as “beta” (β)) and/or the wavelength of the EMwaves (λ). The velocity of the beam of particles may be approximatelyequal to the phase velocity of the waves. The cell length 206 may bedetermined by a product of β and λ. For example, the cell length 206 (L)may be given by L=β*λ*θ/2π, where θ is the phase advance of the cell140. In certain wavelengths, the cell length 206 may scale with β suchthat the cell length 206 is approximated by β multiplied by 6.1 mm. Thecell length 206 may be between about 0.5 mm and 5.5 cm, between about 1mm and 6 mm, and in some embodiments is about 2 mm or 3 mm (depending onthe cell type). For example, using S-band waves operating at a π-modewith β=1, the cells may be as long as about 5.5 cm. For a similararchitecture in C-band, the cells may be about 2.6 cm. Shorter cells maybe used, for example, when using Ka-band at a π/2-mode. Such cells maybe about 0.9 mm long. Other variants are possible depending on thedesired implementation.

The cell diameter 202, as measured perpendicular to the beam axis 108,can vary based on the type of cell, the wavelength used, and thevelocity of the beam of particles. The cell diameter 202 can be betweenabout 1 mm and 10 cm, between about 3 mm and 2 cm, and in someembodiments is about 1 cm, 8 cm, or 9 cm (depending on the cell type).The iris thickness 210 can be between about 0.1 mm and 30 mm, betweenabout 0.3 mm and 2 mm, and in some embodiments is about 0.7 mm(depending on the cell type). The cell diameter 202 can be associatedwith the frequency of the RF power. For example, the chosen RF power maydetermine in part what the cell diameter 202 is. The iris thickness 210may be advantageously small, but this may be limited by structural andthermal features of the split linac 104.

Other dimensions are shown, such as an iris blend radius 214 and a cellblend radius 218. The iris blend radius 214 can depend in part on theiris thickness 210. The iris blend radius 214 can be between about 0.05mm and 5 mm, between about 0.1 mm and 1 mm, and in some embodiments isabout 0.4 mm (depending on the cell type). The cell blend radius 218 candepend on the cell length 206 and/or on the iris thickness 210. It maybe advantageous to improve the cell blend radius 218 by increasing theQ-factor. The maximum cell blend radius 218 may be determined by halfthe difference between the cell length 206 and the iris thickness 210.The cell blend radius 218 can be between about 0.05 cm and 20 cm,between about 1 cm and 5 cm, and in some embodiments is between about0.3 cm and 0.5 cm or is about 2.5 cm (depending on the cell type). Thecell blend radius 218 may advantageously be as large as possible toallow for improved linac operation. The iris aperture diameter 222 canbe between about 0.1 mm and 50 mm, between about 1 mm and 15 mm, and insome embodiments is about 8 mm. The iris aperture diameter 222 can beassociated with (e.g., be determined by) the strength of the fieldproduced in the split linac 104.

FIG. 7 shows additional dimensions of an example split linac portion 104a that may be considered. A cell radius 204 is shown, which is half ofthe cell diameter 202. An iris aperture radius 224 is shown. The irisaperture radius 224 can be defined by an intersection of a gap plane 240and a bisecting plane 244. The gap plane 240 may be coplanar, forexample, with an attachment surface of the split linac portion 104 a. Adistance between the gap plane 240 and an accelerating surface can begiven by a gap half-width 226, as shown. A transition between theaccelerating surface and the surface defining the cell radius 204 can bedescribed as a gap blend radius 236. A transition between theaccelerating surface and a surface defining the iris aperture radius 224can be described as an iris blend radius 228. A distance between thebisecting plane 244 and an end of the accelerating surface can bedescribed as a gap half-length 232. The bisecting plane 244 can dividethe split linac portion 104 a into two portions where each acceleratingcell portion 140 a is bisected by the bisecting plane 244.

The split linac 104 can have various dimensions that may take on variousvalues. For example, the cell radius 204 may be between about 1 mm and100 mm, between about 5 mm and 65 mm, and in some embodiments is about10 mm (e.g., at Ka-band) or about 90 mm (e.g., at S-band). The irisaperture radius 224 may be between about 0.5 mm and 20 mm, between about2 mm and 15 mm, and in some embodiments is about 10 mm. The gaphalf-width 226 may be between about 0.5 mm and 15 mm, between about 1 mmand 10 mm, and in some embodiments is about 3 mm. The gap half-length232 may be between about 0.5 cm and 10 cm, between about 2 cm and 7 cm,and in some embodiments is about 5 cm. In some embodiments, the gaphalf-length 232 is greater than the cell diameter 202. The iris blendradius 228 may be between about 0.5 mm and 35 mm, between about 1 mm and20 mm, and in some embodiments is about 10 mm. The gap blend radius 236may be between about 0.5 mm and 35 mm, between about 1 mm and 20 mm, andin some embodiments is about 10 mm.

FIGS. 8 and 9 show an example split linac portion 104 a and an examplesplit linac portion 104 b, respectively. As shown, the split linacportion 104 a can include one or more connecting elements 248. The splitlinac portion 104 b can include corresponding one or more receivingportions 252. Each receiving portion 252 can receive a correspondingconnecting element 248. The connecting element 248 may be a rod, ajoint, a protrusion, or any other type of connector. The receivingportion 252 may be an opening, a recess, an attachment device, or anyother type of device configured to receive the connecting element 248.In some embodiments, the connecting element 248 and receiving portion252 are sufficient to keep the split linac portions 104 a, 104 btogether and/or aligned sufficiently to undergo a bonding (e.g.,welding, brazing, etc.) process.

FIG. 10 shows a thermal performance heat map of an example split linac104. The heat load shown assumes 50 W of RF average power. Two boundaryconditions were considered: natural air convection (heat transfercoefficient of about 10 W/m²K) and forced air convection from a moderateairflow fan with heat transfer coefficient of about 25 W/m²K, whichcorresponds to less than about 5 m/s air flow speed. As shown in FIG. 17, the temperature of the structure rises from 20° C. to 40° C., but thetemperature gradient inside the structure remains below 0.5° C. Thetemperature gradient (e.g., difference between two temperatures in thesplit linac 104) can indicate potential thermal deformations inside thestructure and/or frequency deviations of the structure. Thus, lowertemperature gradients can be advantageous.

FIG. 11 shows an example accelerating structure 120. The acceleratingstructure 120 may represent the negative space that is occupied byair/vacuum in one or more embodiments of the split linac 104 describedherein. The accelerating structure 120 can include a plurality ofaccelerating cells 140 in sequence. However, as noted above, theaccelerating cells 140 may be in a cyclic structure, such as a circularaccelerator (e.g., microtron). As shown, the accelerating structure 120can include a gap 256, which is indicated with reference to variousembodiments of a split linac 104 herein. The accelerating structure 120can include a linac entrance aperture 112 and a linac exit aperture 116.While the accelerating structure 120 is shown as having 9 cells, otherconfigurations (including more or fewer cells) are possible. The gap 256can advantageously allow for better vacuum pumping and/or for preventingbeam break up (e.g., current instability). The gap 256 may also reducethe strain on the material of the split linac 104, such as copper orother material described herein. Reduced strain can allow for operationat greater temperatures, thus allowing for higher energy use and/orallowing for reduced cooling necessity.

FIGS. 12A-12B show portions of the accelerating structure 120 shown inFIG. 11 . FIG. 12A shows an isometric view of a portion of anaccelerating cell 140 with various dimensions labeled. Some dimensionsare disclosed elsewhere herein. The gap length 230 may be between about5 mm and 200 mm, between about 10 mm and 150 mm, and in some embodimentsis about 20 mm. FIG. 12B shows some additional dimensions of an exampleaccelerating structure 120. For example, the gap width 225 may bebetween about 0.1 mm and 30 mm, between about 1 mm and 10 mm, and insome embodiments is about 6 mm. The gap width 225 may be related to thewavelength of the RF power. For example, the gap width 225 can begreater than about 1 mm, which may depend on the frequency of the RFpower. In some embodiments, the cell length 206 may be less than abouthalf the wavelength.

FIG. 13 shows a schematic of an example RF waveguide network 300. The RFwaveguide network 300 can include an energy source 304, a fluid inlet308, a detector 312, an RF inlet aperture 316, a waveguide 320, a RFoutlet aperture 324, and/or a capture device 328. The waveguide 320 canbe purged with a fluid or gas (e.g., SF₆) to prevent the risk of arcing.The waveguide 320 may correspond to the accelerating structure 120and/or the split linac 104 described herein. To isolate the vacuumvolume of the accelerator from the waveguide, one or more microwavewindows may be attached to the waveguide 320. The passive devices mayhave a ceramic barrier (e.g., ultra-high purity alumina) to block gaswhile still allowing microwave power to flow. To terminate the unused RFpower, there may be a ferrite load at the output of the structure. TheRF waveguide network 300 may be a particle source, such as a commercialdiode gun with small cathode (e.g., less than 3 mm diameter) andfocusing electrodes. The detector 312 may include a reflectometer. TheRF waveguide network 300 can include a driver, such as a gun driver. Thedriver may be configured to provide approximately constant power to heata filament inside a thermionic cathode. The gun driver may produce theHV pulses (e.g., 15 kV) to cause the gun to emit electrons and provideenough initial acceleration for the linac to efficiently capture theparticles. In some embodiments, a thermionic gun may be used, which canemit electrons from a cathode heated to a sufficiently high temperature.The electron gun driver may be integrated with a magnetron modulator.The magnetron modulator's output may be tapped at a lower voltageportion of the circuit, which may allow driving the energy source 304with the same pulse.

FIG. 14A shows an example linac head 400 that may include one or morecomponents described herein, such as those shown in FIG. 13 . FIG. 14Bshows another angle of the linac head 400, including the split linacportions 104 a, 104 b as an approximate size comparison. The individualelements may not necessarily be shown to scale. The linac head 400 maybe included in a larger device, such as a detector, an X-ray machine(e.g., for medical applications), irradiation, material discrimination,cargo inspection, nuclear forensics, or some other device. As shown, thelinac head 400 can include an energy source 304, a particle source 408,a vacuum pump 404, a split linac 104, a converter 412, and/or a capturedevice 328. The energy source 304 can be any energy source configured toemit electromagnetic waves for pumping into a split linac 104. Forexample, a magnetron may be used, such as a Ku-band magnetron. A lighterenergy source 304 may be advantageous to allow, for example, forhand-held operation of the linac head 400. Additionally oralternatively, a relatively low anode voltage may be advantageous toreduce the power consumption and/or increase the efficiency of theenergy source 304. The particle source 408 can include an electron gun,such as a diode electron gun. The energy source 304 can be configured toemit waves tuned to accelerate particles emitted by the energy source304. The energy source 304 can inject energy into the split linac 104,such as through an input coupling element (e.g., the RF input couplingelement 124 described herein). The energy source 304 can produce betweenabout 10 kW and 250 kW, between about 25 kW and 95 kW, and in someembodiments produces about 50 kW power. In some embodiments, the energysource 304 can produce between about 200 kW and 3 MW. Higher energysources (e.g., magnetrons up to 7 MW) can be used. The amount of powerproduced may be larger than a minimum necessary power (e.g., 40 kW). Asafety margin between the power output and the minimum required outputcan allow operation in a lower power mode that may extend the lifetimeof the energy source 304.

The particle source 408 can be configured to inject particles into thesplit linac 104 along a beam axis or optical axis. The output currentmay be regulated with the cathode temperature. For example, a highcurrent density small dispenser cathode may be used to provide arelatively stable emission of up to 170 mA and/or up to or more than10,000 hrs operation with greater than 95% of the initial cathodecurrent. The cathode may have a diameter of only 1.45 mm. In otherembodiments, an off-the-shelf compact diode electron gun may be used.Such an electron gun may be simpler to incorporate into the design andmay have a focusing electrode to improve the acceptance of the beam.

The vacuum pump 404 can be configured to create and/or maintain a vacuumwithin the accelerating structure (e.g., the accelerating structure 120herein) of the split linac 104. The total vacuum volume of the linachead 400 is relatively small, especially compared to conventionallinacs. Accordingly, pumps with lower rates of pumping can be used. Forexample, rates such as 10 l/s may be sufficient for this device.Non-evaporable getter (NEG) pumps may be used. Such pumps may employ ahybrid pumping mechanism that uses a renewable chemical absorption pump(the NEG element) and a small ion pump. This may promote larger pumpingspeeds in a relatively compact package. For example, the pump may have a100 l/s NEG element combined with a 5 l/s ion pump. After activation,the NEG element may require no electrical power. Thus, in someembodiments, the linac head 400 power requirements and weight can bereduced. When the system is stored, the ion pump can be reconnected toremove the noble gases that the NEG pump cannot.

The split linac 104 can have between 10 and 50 cells, such as thosedescribed herein. In some embodiments, the particles (e.g., electrons)can be incident on a converter 412 to produce energy, such as X-rays.The capture device 328 can be configured to receive an RF load capableof dissipating up to about 100 kW of peak RF power, up to about 80 kW,and in some embodiments up to about 60 kW of peak RF power.

The linac head 400 can be configured to fit into specific dimensions. Itmay be advantageous to create a smaller, more compact linac head 400that can be hefted by a human. For example, the linac head 400 may havea linac head width 420 and a linac head height 424. The linac head width420 can be between about 5 cm and 120 cm, between about 8 cm and 90 cm,and in some embodiments is about 18 cm. The linac head height 424 can bebetween about 10 cm and 200 cm, between about 15 cm and 150 cm, and insome embodiments is about 20 cm. The linac head depth (not shown in FIG.14A) can be between about 3 cm and 70 cm, between about 5 cm and 50 cm,and in some embodiments is about 10 cm. The linac head 400 can have atotal interior volume of between about 100 cm³ and 15000 cm³, betweenabout 300 cm³ and 10000 cm³, and in some embodiments is about 3600 cm³.A total weight of the linac head 400 can be between about 1 kg and 80kg, between about 3 kg and 25 kg, and in some embodiments is about 5 kg.

FIGS. 15A-15B show two examples of cross sections of portions of a splitlinac assembly operating in a standing wave configuration. FIG. 15Ashows an example portion without a nose in the iris and FIG. 15B showssplit linac portions having iris nose portions 170 a, 170 b (whichtogether comprise iris nose 170). The iris nose portions 170 a, 170 bcan be configured to increase shunt impedance. As is described in moredetail herein, each iris nose 170 (and/or corresponding iris noseportions 170 a, 170 b) may include increasing thickness in thecorresponding cell iris 136 radially along a portion of the cell iris136, as shown. Just radially from the iris aperture 144 of thecorresponding cell iris 136, the iris nose 170 may include a decrease inthickness of the cell iris 136. Accordingly, a cross-section of the irisnose 170 can include opposing nose-shaped structures. Details of variousembodiments of such noses are described in more detail herein.Additional details are included in PCT Application No.PCT/US2018/030980, filed May 3, 2018, entitled “COMPACT HIGH GRADIENTION ACCELERATING STRUCTURE,” which is hereby incorporated by referenceherein in its entirety and for all purposes.

The iris nose 170 can be described using one or more of a number ofdimensions. A slope of the iris nose 170 can be described by a nose riseangle. The nose rise angle can be between about 35° and 90° (e.g., nonose at all) and in some embodiments is between about 50° and 75°. Insome embodiments the nose rise angle is about 66°. A maximum thicknessof the iris nose 170 can be between about 0.2 mm and 15 mm and in someembodiments is between about 0.4 mm and 11 mm. In some embodiments themaximum thickness of the iris nose 170 is about 1 mm. A ratio of themaximum thickness of the iris nose 170 and the iris thickness is betweenabout 1 (no nose) and 8, and in some embodiments is between about 2 and5. In some embodiments, the ratio is about 3. The iris nose 170 caninclude an increased thickness of a portion of the joint structurebetween neighboring cells of the first plurality of cells such that theincreased thickness is relative to one or more regions surrounding thenose of the portion of the joint structure.

As noted, FIGS. 15A-15B may correspond to portions of cells that areused in a π-mode structure (e.g., standing wave (SWG)). Such a structuremay be used in an open structure configuration. In open structures,there may be a gap between corresponding elements (e.g., halves) of thelinac (e.g., a gap indicated by the gap width 225). Open structures mayreduce problems related to the surface mismatch after the elements areattached. The cell diameter 202 (not labeled) may be any value describedherein, such as between about 1 cm and 5 cm or about 2.5 cm. The irisaperture diameter 222 (not labeled) may be any value described herein,such as between about 0.5 mm and 5 mm. The shunt impedance may be anyvalue described herein, such as between about 100 MΩ/m and 150 MΩ/m.

FIGS. 16A-16B show two examples of cross sections of portions of a splitlinac assembly operating in a traveling wave (TW) configuration. Asshown the iris aperture 144 may be larger in TW linacs than in SWlinacs. Advantageously, a larger iris aperture 144 (e.g., greater irisaperture diameter 222) may reduce filling time of the cells. The irisaperture diameter 222 can allow for a range of filling times, such asbetween about 250 ns and 1000 ns. In some embodiments, the filling timecan be less than 500 ns and in some embodiments is less than 250 ns,less than 200 ns, and in certain embodiments has a filling time of about160 ns.

FIGS. 17A-17C show portions of a linac each having both an iris noseportion 170 a and a side cell portion 180 a. Particle accelerators,including split-structure particle accelerators, may include nosesand/or side cells (e.g., side coupling cells) to improve performance.For example, side cells 180 may be included to improve frequencystability. One or more side cells 180 may include corresponding sidecell portions 180 a, 108 b. FIG. 17A shows an example side cell portion180 a. The side cell portion 180 a may include one or more sections,such as a distal portion 182 a, a medial portion 184 a, and/or aproximal portion 186 a. The medial portion 184 a may be disposed betweenthe distal portion 182 a and the proximal portion 186 a. The termsdistal, proximal, and medial may refer to a distance from the irisaperture 144. The side cell length 188 may be as shown in FIG. 17B.However, each of the portions of the side cell portion 180 a may have acorresponding length. For example, the medial portion 184 a may have alength that is smaller than one or both of a corresponding length of thedistal portion 182 a and/or the proximal portion 186 a. A transitionbetween distal portion 182 a and medial portion 184 a and/or betweenmedial portion 184 a and proximal portion 186 a may be relatively sudden(e.g., as shown in FIG. 17A). This may be referred to as a “rectangular”coupling cell. However, in other embodiments, the transition is moregradual (e.g., in FIG. 17B or 17C). The transition may be referred to asa blend or blend radius.

The side cell length 188 may be between about 0.5 mm and 5.5 cm, betweenabout 1 mm and 6 mm, and in some embodiments is about 2 mm or 3 mm(depending on the cell type). The medial portion 184 a may have a lengththat is less than these values or within those ranges.

FIG. 18 shows an example of a split linac portion 104 a having aplurality of side cell portions 180 a. The split linac portion 104 a mayinclude one or more types of cells, such as the first cell type 141 aand second cell type 141 b shown. The first cell type 141 a may bereferred to as “bunching cells.” The bunching cells may be configured toaccelerate particles at higher than 0.30. The bunching cells may have ashorter period and/or smaller blend radius than accelerating cells of adifferent type. For example, the blend radius of the bunching cells maybe 2.5 mm while other accelerating cells 140 may have a higher radius(e.g., 5 mm or other value disclosed herein). Additional types ofaccelerating cells 140 may be included (see, e.g., FIG. 4 ). The sidecell portions 180 a may be axially offset from the accelerating cells140 (e.g., first cell type 141 a, second cell type 141 b, etc.). Theinclusion of side cells 180 may reduce the Q-factor relative to particleaccelerators not having side cells. Q-factor can represent a ratio ofstored energy multiplied by an angular frequency in oscillating fieldsto ohmic losses. The Q-factor may refer to a quality of how much aresonator is damped. For example, a higher Q-factor may result in longerlasting oscillations. The inclusion of one or more side cells 180 may bereferred to as a side-coupled structure or an open side-coupledstructure (OSCL).

One or more cooling channels may be included in the split linac 104. Forexample, as shown in FIG. 18 , a plurality of cooling channels 190 maybe disposed in the split linac portion 104 a. Additional coolingchannels may be in the split linac portion 104 b. The cooling channels190 may be configured to guide fluid (e.g., water) through the splitlinac portion 104 a. The cooling channels 190 may be oriented roughlyalong the length of the split linac portion 104 a. For example, one ormore of the cooling channels 190 may be disposed approximately parallelto the beam axis of the split linac 104. One or more of the coolingchannels 190 may have a diameter of between about 0.5 mm and 12 mm. Insome embodiments, the diameter is between about 2 mm and 8 mm, and incertain embodiments is about 5 mm. The cooling channels 190 may beconfigured to draw heat at between about 2 kW/m²/K and 30 kW/m²/K, andin some embodiments at about 15 kW/m²/K. The split linac 104 may include1, 2, 3, 4, 5, 6, 8, 10, 12, or more cooling channels 190.

FIG. 19A shows an example heat map of a split linac 104 having fourcooling channels 190. FIG. 19B shows an example heat map of a splitlinac 104 having six cooling channels 190. Additional or fewer coolingchannels 190 may be used. FIG. 20 shows an example acceleration gradient(in MV/m) along the beam path that may be achieved by a split linac 104described herein.

Conditional language, such as, among others, “can,” “could,” “might,” or“may,” unless specifically stated otherwise, or otherwise understoodwithin the context as used, is generally intended to convey that certainembodiments include, while other embodiments do not include, certainfeatures, elements and/or steps. Thus, such conditional language is notgenerally intended to imply that features, elements and/or steps are inany way required for one or more embodiments or that one or moreembodiments necessarily include logic for deciding, with or without userinput or prompting, whether these features, elements and/or steps areincluded or are to be performed in any particular embodiment.

It should be emphasized that many variations and modifications may bemade to the above-described embodiments, the elements of which are to beunderstood as being among other acceptable examples. All suchmodifications and variations are intended to be included herein withinthe scope of this disclosure. The foregoing description details certainembodiments of the invention. It will be appreciated, however, that nomatter how detailed the foregoing appears in text, the invention can bepracticed in many ways. As is also stated above, the use of particularterminology when describing certain features or aspects of the inventionshould not be taken to imply that the terminology is being re-definedherein to be restricted to including any specific characteristics of thefeatures or aspects of the invention with which that terminology isassociated. The scope of the invention should therefore be construed inaccordance with the appended embodiments and/or claims and anyequivalents thereof.

EXAMPLES

The following provides a list of examples of those described herein.This is a non-exhaustive and non-limiting list of examples.

In a 1st example, a linear accelerating structure for use inaccelerating charged particles, the linear accelerating structurecomprising: a first waveguide structure having a first substantiallysemi-cylindrical internal surface with a first plurality of ridgesspaced apart along a first longitudinal axis of the first waveguidestructure, each of the first plurality of ridges extending radially fromthe first substantially semi-cylindrical internal surface, wherein thefirst waveguide structure comprises a first bonding surface; and asecond waveguide structure having a second substantiallysemi-cylindrical internal surface with a second plurality of ridgesspaced apart along a second longitudinal axis of the second waveguidestructure, each of the second plurality of ridges extending radiallyfrom the second substantially semi-cylindrical internal surface, whereinthe second waveguide structure comprises a second bonding surface;wherein a first spacing between respective pairs of adjacent ridges ofthe first plurality of ridges along the first longitudinal axis is equalto a second spacing between a corresponding pair of adjacent ridges ofthe second plurality of ridges along the second longitudinal axis, andwherein the first bonding surface and the second bonding surface areconfigured to bind together to define a joined structure having asubstantially cylindrical internal surface with corresponding ridges ofthe first and second plurality of ridges forming a plurality ofaccelerating cells each having a central aperture configured to allow abeam of charged particles to travel therethrough along a longitudinalaxis extending through central apertures of each of the plurality ofaccelerating cells, the plurality of accelerating cells comprising aninput coupling cell configured to receive electromagnetic waves from amagnetron; wherein at least one of the plurality of accelerating cellsis configured to accelerate the beam of charged particles to a velocitybetween 0.1 and 1.0 times the speed of light; and wherein the joinedstructure is configured to propagate electromagnetic waves at afrequency greater than 1.0 GHz.

In a 2nd example, the linear accelerator of example 1, wherein at leastone of the plurality of accelerating cells comprises an output couplingcell configured to direct an output of electromagnetic waves having afrequency greater than 1.0 GHz out of the joined structure.

In a 3rd example, the linear accelerating structure of any of examples1-2, wherein the joined structure comprises one or more of copper,stainless steel, aluminum, or niobium.

In a 4th example, the linear accelerating structure of any of examples1-3, wherein the first and second longitudinal axes are coaxial in thejoined structure.

In a 5th example, the linear accelerating structure of any of examples1-4, wherein the plurality of accelerating cells is configured tooperate a standing electromagnetic wave at an operation mode.

In a 6th example, the linear accelerating structure of examples 5,wherein the operation mode is such that the phase of the wave inadjacent cells differs by an amount between π/2 and π.

In a 7th example, the linear accelerating structure of any of examples1-4, wherein the plurality of accelerating cells is configured to housea traveling electromagnetic wave at an operation mode. The linearaccelerating structure of example 7 may operate at an operation modesuch that the phase of the wave in adjacent cells differs by an amountbetween π/2 and π.

In an 8th example, the linear accelerating structure of any of examples1-8, wherein the joined structure has a total length measured along abeam axis of less than 1.0 m.

In a 9th example, the linear accelerating structure of any of examples1-9, further comprising an electromagnetic generator configured togenerate electromagnetic waves at a frequency greater than 1.0 GHz.

In a 10th example, the linear accelerating structure of any of examples1-10, further comprising a charged particle generator configured toaccelerate charged particles along a beam axis.

In an 11th example, the linear accelerator of any of examples 1-11wherein the joined structure is configured to provide an accelerationgradient greater than 1 MV/m.

In a 12th example, the linear accelerating structure of any of examples1-12, wherein the plurality of accelerating cells comprises a firstaccelerating cell and a second accelerating cell, the first acceleratingcell configured to accelerate the beam of charged particles at a firstvelocity and the second accelerating cell configured to accelerate thebeam of charged particles at a second velocity different from the firstvelocity.

In a 13th example, the linear accelerating structure of any of examples1-13, wherein a joint formed by attachment of the first and secondwaveguide structures comprises a weld.

In a 14th example, the linear accelerating structure of any of examples1-13, wherein a joint formed by attachment of the first and secondwaveguide structures comprises a braze.

In a 15th example, the linear accelerating structure of any of examples1-13, wherein a joint formed by attachment of the first and secondwaveguide structures comprises a diffusion bond.

In a 16th example, a waveguide for use in accelerating chargedparticles, the waveguide comprising: a first structure comprising afirst plurality of recesses spaced along a first axis; and a secondstructure comprising a second plurality of recesses spaced along asecond axis; wherein a spacing between two adjacent recesses of thefirst plurality of recesses along the first axis matches a spacingbetween two corresponding adjacent recesses of the second plurality ofrecesses along the second axis; and wherein the first structure and thesecond structure are joined such that the first and second plurality ofrecesses form a plurality of accelerating cells, the plurality ofaccelerating cells configured to accelerate a beam of charged particlesalong a beam axis at a velocity between 0.1 and 1.0 times the speed oflight.

In a 17th example, the waveguide of example 17, wherein each of thefirst plurality of recesses of the first structure forms a shape of ahalf-disc or ellipsoid.

In an 18th example, the waveguide of example 18, wherein the half-discis oriented perpendicular to the beam axis.

In a 19th example, the waveguide of any of examples 17-19, wherein thefirst structure comprises a plurality of ridges separating each adjacentrecess of the first plurality of recesses, each of the plurality ofridges forming half of an aperture configured to allow the beam ofcharged particles to travel therethrough along the beam axis.

In a 20th example, a method of manufacturing a linear accelerator, themethod comprising: providing a first waveguide structure comprising afirst plurality of recesses spaced apart along a first longitudinal axisof the first waveguide structure, the first plurality of recesses eachextending radially from the first longitudinal axis of the firstwaveguide structure, wherein the first waveguide structure comprises afirst bonding surface; providing a second waveguide structure comprisinga second plurality of recesses spaced apart along a second longitudinalaxis of the second waveguide structure, the second plurality of recesseseach extending radially from the second longitudinal axis of the secondwaveguide structure, wherein the second waveguide structure comprises asecond bonding surface; aligning the first plurality of recesses withthe second plurality of recesses; and joining the first waveguidestructure to the second waveguide structure such that the first andsecond plurality of recesses forming a plurality of accelerating cellsof a joint structure; wherein each of the plurality of acceleratingcells has a central aperture configured to allow a beam of chargedparticles to travel therethrough along a longitudinal axis extendingthrough central apertures of each of the plurality of acceleratingcells, the plurality of accelerating cells configured to accelerate thebeam of charged particles to a velocity less than the speed of light.

In a 21st example, the method of example 21, wherein joining the firstwaveguide structure to the second waveguide structure to form the jointstructure comprises electron beam welding.

In a 22nd example, the method of example 21, wherein joining the firstwaveguide structure to the second waveguide structure to form the jointstructure comprises brazing.

In a 23rd example, the method of example 21, wherein joining the firstwaveguide structure to the second waveguide structure to form the jointstructure comprises diffusion bonding.

In a 24th example, the method of any of examples 21-24, wherein joiningthe first waveguide structure to the second waveguide structure to formthe joint structure comprises supplying a joining metal.

In a 25th example, the method of example 25, wherein the joining metalcomprises copper.

In a 26th example, the method of example 25, wherein the joining metalcomprises stainless steel.

In a 27th example, the method of any of examples 21-27, furthercomprising the step of forming the first plurality of recesses in thefirst waveguide structure.

In a 28th example, the method of example 28, wherein forming the firstplurality of recesses in the first waveguide structure comprisesmilling.

In a 29th example, the method of example 28, wherein forming the firstplurality of recesses in the first waveguide structure compriseselectrical discharge machining.

In a 30th example, the method of any of examples 21-30, wherein theplurality of accelerating cells comprising an input coupling cellconfigured to receive electromagnetic waves from a magnetron.

In a 31st example, a particle accelerator comprising: a first waveguideportion comprising: a first plurality of cell portions; a first irisportion disposed between two of the first plurality of cell portions,the first iris portion comprising a portion of an aperture, the apertureconfigured to be disposed about a beam axis; and a first bondingsurface; and a second waveguide portion comprising: a second pluralityof cell portions; a second iris portion disposed between two of thesecond plurality of cell portions, the second iris portion comprising aportion of an aperture, the aperture configured to be disposed about abeam axis; and a second bonding surface; wherein: the first bondingsurface is disposed adjacent the second bonding surface, the first andsecond plurality of cell portions form a plurality of acceleratingcells, and the first and second iris portions form an iris.

In a 32nd example, the particle accelerator of example 32, wherein theaperture is configured to allow a beam of charged particles to traveltherethrough along the beam axis.

In a 33rd example, the particle accelerator of any of examples 32-33,wherein the beam axis extends through a center of each of the pluralityof accelerating cells.

In a 34th example, the particle accelerator of any of examples 32-34,further comprising an input coupling cell configured to receiveelectromagnetic waves therethrough.

In a 35th example, the particle accelerator of any of examples 32-35,wherein at least one of the plurality of accelerating cells isconfigured to accelerate a beam of charged particles to a velocitybetween 0.1 and 1.0 times the speed of light; and

In a 36th example, the particle accelerator of any of examples 32-36,wherein the particle accelerator is configured to propagateelectromagnetic waves at a frequency greater than 1.0 GHz.

In a 37th example, the particle accelerator of any of examples 32-37,wherein the particle accelerator is configured to operate at a modebetween π/2 and π.

In a 38th example, the particle accelerator of any of examples 32-38,wherein a joint formed by attachment of the first and second waveguideportions comprises a braze.

In a 39th example, the particle accelerator of any of examples 32-39,wherein the joined structure is configured to provide an accelerationgradient greater than 1 MV/m.

In a 40th example, a method of manufacturing a particle accelerator, themethod comprising: providing a first waveguide structure comprising afirst plurality of recesses disposed along a first longitudinal axis ofthe first waveguide structure, wherein the first waveguide structurecomprises a first bonding surface; providing a second waveguidestructure comprising a second plurality of recesses disposed along asecond longitudinal axis of the second waveguide structure, wherein thesecond waveguide structure comprises a second bonding surface; aligningthe first plurality of recesses with the second plurality of recesses;and joining the first waveguide structure to the second waveguidestructure such that the first and second plurality of recesses form aplurality of accelerating cells of a joint structure; wherein each ofthe plurality of accelerating cells has a central aperture configured toallow a beam of charged particles to travel therethrough along alongitudinal axis extending through central apertures of each of theplurality of accelerating cells.

In a 41st example, the method of example 40, wherein joining the firstwaveguide structure to the second waveguide structure to form the jointstructure comprises electron beam welding.

In a 42nd example, the method of any of examples 40 to 41, whereinjoining the first waveguide structure to the second waveguide structureto form the joint structure comprises brazing.

In a 43rd example, the method of any of examples 40 to 42, whereinjoining the first waveguide structure to the second waveguide structureto form the joint structure comprises diffusion bonding.

In a 44th example, the method of any of examples 40 to 43, whereinjoining the first waveguide structure to the second waveguide structureto form the joint structure comprises supplying a joining metal.

In a 45th example, the method of any of examples 40 to 44, wherein thejoining metal comprises copper.

In a 46th example, the method of any of examples 40 to 45, wherein thejoining metal comprises stainless steel.

In a 47th example, the method of any of examples 40 to 46, furthercomprising the step of forming the first plurality of recesses in thefirst waveguide structure.

In a 48th example, the method of example 47, wherein forming the firstplurality of recesses in the first waveguide structure comprisesmilling.

In a 49th example, the method of any of examples 47 or 48, whereinforming the first plurality of recesses in the first waveguide structurecomprises electrical discharge machining.

In a 50th example, the method of any of examples 40 to 49, wherein theplurality of accelerating cells comprising an input coupling cellconfigured to receive electromagnetic waves from a magnetron.

In a 51st example, the method of any of examples 40 to 50, wherein thefirst waveguide structure further comprises a first plurality of siderecesses and wherein the second waveguide structure further comprises asecond plurality of side recesses.

In a 52nd example, the method of example 51, wherein at least one recessof the first plurality of side recesses is axially offset from acorresponding recess of the first plurality of recesses.

In a 53rd example, the method of any of examples 51 to 52, wherein theat least one recess of the first plurality of side recesses comprises: aproximal portion having a length; a distal portion having a length; anda medial portion having a length, the medial portion disposed betweenthe proximal and distal portions; wherein the length of the medialportion is less than the length of the proximal portion.

In a 54th example, the method of any of examples 40 to 53, wherein atleast one of the plurality of accelerating cells comprises a nose.

In a 55th example, the method of example 54, wherein the nose comprisesan increased thickness of a portion of the joint structure betweenneighboring cells of the first plurality of cells, the increasedthickness being relative to one or more regions surrounding the nose ofthe portion of the joint structure.

In a 56th example, the method of any of examples 54 to 55, wherein thenose is configured to increase shunt impedance of a correspondingaccelerating cell or plurality of corresponding accelerating cells ofthe joint structure.

In a 57th example, the method of any of examples 40 to 56, furthercomprising forming one or more channels within the joint structureconfigured to pass fluid therethrough, the one or more channels notintersecting with any of the plurality of accelerating cells.

In a 58th example, the method of example 57, wherein at least one of theone or more channels is disposed substantially parallel to beam axis.

In a 59th example, a particle accelerator comprising: a first waveguideportion comprising: a first plurality of cell portions; a first irisportion disposed between two of the first plurality of cell portions,the first iris portion comprising a first portion of an aperture; and afirst bonding surface; and a second waveguide portion comprising: asecond plurality of cell portions; a second iris portion disposedbetween two of the second plurality of cell portions, the second irisportion comprising a second portion of the aperture; and a secondbonding surface; wherein: the first bonding surface is disposed adjacentthe second bonding surface, the first and second plurality of cellportions form a plurality of accelerating cells, and the first andsecond iris portions form an iris and the aperture, the apertureconfigured to be disposed about a beam axis.

In a 60th example, the particle accelerator of example 59, wherein theaperture is configured to allow a beam of charged particles to traveltherethrough along the beam axis.

In a 61st example, the particle accelerator of any of examples 59 to 60,wherein the beam axis extends through a center of each of the pluralityof accelerating cells.

In a 62nd example, the particle accelerator of any of examples 59 to 61,further comprising an input coupling cell configured to receiveelectromagnetic waves therethrough.

In a 63rd example, the particle accelerator of any of examples 59 to 62,wherein at least one of the plurality of accelerating cells isconfigured to accelerate a beam of charged particles to a velocitybetween 0.1 and 1.0 times the speed of light.

In a 64th example, the particle accelerator of any of examples 59 to 63,wherein the particle accelerator is configured to propagateelectromagnetic waves at a frequency greater than 1.0 GHz.

In a 65th example, the particle accelerator of any of examples 59 to 64,wherein the particle accelerator is configured to operate at a modebetween π/2 and π.

In a 66th example, the particle accelerator of any of examples 59 to 65,wherein a joint formed by attachment of the first and second waveguideportions comprises a braze.

In a 67th example, the particle accelerator of any of examples 59 to 66,wherein the joined structure is configured to provide an accelerationgradient greater than 1 MV/m.

In a 68th example, the particle accelerator of any of examples 59 to 67,wherein the first waveguide portion further comprises a first pluralityof side cell portions and wherein the second waveguide portion furthercomprises a second plurality of side cell portions.

In a 69th example, the particle accelerator of example 68, wherein atleast one cell portion of the first plurality of side cell portions isaxially offset from a corresponding cell portion of the first pluralityof cell portions.

In a 70th example, the particle accelerator of any of examples 68 to 69,wherein the at least one cell portion of the first plurality of sidecell portions comprises: a proximal portion having a length; a distalportion having a length; and a medial portion having a length, themedial portion disposed between the proximal and distal portions;wherein the length of the medial portion is less than the length of theproximal portion.

In a 71st example, the particle accelerator of any of examples 59 to 70,wherein at least one of the plurality of accelerating cells comprises anose.

In a 72nd example, the particle accelerator of example 71, wherein thenose comprises an increased thickness of a portion of the jointstructure between neighboring cells of the first plurality of cells, theincreased thickness being relative to one or more regions surroundingthe nose of the portion of the joint structure.

In a 73rd example, the particle accelerator of any of examples 71 to 72,wherein the nose is configured to increase shunt impedance of acorresponding accelerating cell or plurality of correspondingaccelerating cells of the joint structure.

In a 74th example, the particle accelerator of any of examples 59 to 73,further comprising forming one or more channels within the jointstructure configured to pass fluid therethrough, the one or morechannels not intersecting with any of the plurality of acceleratingcells.

In a 75th example, the particle accelerator of example 74, wherein atleast one of the one or more channels is disposed substantially parallelto beam axis.

What is claimed is:
 1. A method of manufacturing a particle accelerator,the method comprising: providing a first waveguide structure comprising:a first plurality of accelerating recesses disposed along a firstlongitudinal axis of the first waveguide structure; a first plurality ofside recesses each disposed off-axis from one or more of the firstplurality of accelerating recesses; and a first raised outer sectionforming a first recessed inner section surrounding the first pluralityof accelerating recesses and the first plurality of side recesses;providing a second waveguide structure comprising: a second plurality ofaccelerating recesses; a second plurality of side recesses each disposedoff-axis from one or more of the second plurality of acceleratingrecesses; and a second raised outer section forming a second recessedinner section surrounding the second plurality of accelerating recessesand the second plurality of side recesses; aligning the firstpluralities of accelerating and side recesses with correspondingrecesses of the second pluralities of accelerating and side recesses;and joining the first waveguide structure to the second waveguidestructure at the first and second raised outer sections such that thefirst and second pluralities of accelerating and side recesses form aplurality of accelerating cells and side cells of a joint structure. 2.The method of claim 1, wherein joining the first waveguide structure tothe second waveguide structure to form the joint structure compriseselectron beam welding.
 3. The method of claim 1, wherein joining thefirst waveguide structure to the second waveguide structure to form thejoint structure comprises brazing.
 4. The method of claim 1, whereinjoining the first waveguide structure to the second waveguide structureto form the joint structure comprises diffusion bonding.
 5. The methodof claim 1, wherein joining the first waveguide structure to the secondwaveguide structure to form the joint structure comprises supplying ajoining metal.
 6. The method of claim 1, further comprising disposing aparticle source to abut the joint structure.
 7. The method of claim 1,further comprising milling the first plurality of accelerating recessesinto the first waveguide structure.
 8. The method of claim 1, furthercomprising electrical discharge machining at least a portion of thefirst waveguide structure.
 9. The method of claim 1, wherein each of theplurality of accelerating cells has a central aperture configured toallow a beam of charged particles to travel therethrough along alongitudinal axis extending through central apertures of each of theplurality of accelerating cells.
 10. The method of claim 1, wherein atleast one recess of the first plurality of side recesses is axiallyoffset from a corresponding recess of the first plurality ofaccelerating recesses.
 11. A particle accelerator comprising: a firstwaveguide portion comprising: a first plurality of accelerating cellportions; a first plurality of side cell portions; and a first raisedouter section forming a first recessed inner section surrounding thefirst plurality of accelerating cell portions and the first plurality ofside cell portions; and a second waveguide portion comprising: a secondplurality of accelerating cell portions; a second plurality of side cellportions; and a second raised outer section forming a second recessedinner section surrounding the second plurality of accelerating cellportions and the second plurality of side cell portions; wherein: thefirst raised outer section is disposed adjacent the second raised outersection along corresponding bonding surfaces, and the first and secondpluralities of accelerating cell portions form a plurality ofaccelerating cells of a joint structure.
 12. The particle accelerator ofclaim 11, wherein the first waveguide comprises an aperture configuredto allow a beam of charged particles to travel therethrough along a beamaxis.
 13. The particle accelerator of claim 11, further comprising aparticle source configured to abut the joint structure.
 14. The particleaccelerator of claim 11, further comprising an input coupling cellconfigured to receive electromagnetic waves therethrough.
 15. Theparticle accelerator of claim 11, wherein the particle accelerator isconfigured to operate at a mode between π/2 and π.
 16. The particleaccelerator of claim 11, wherein each of the plurality of acceleratingcells comprises a corresponding iris and aperture, each apertureconfigured to be disposed about a beam axis.
 17. The particleaccelerator of claim 11, wherein at least one cell portion of the firstplurality of side cell portions is axially offset from a correspondingcell portion of the first plurality of cell portions.
 18. The particleaccelerator of claim 17, wherein the at least one cell portion of thefirst plurality of side cell portions comprises: a proximal portionhaving a length; a distal portion having a length; and a medial portionhaving a length, the medial portion disposed between the proximal anddistal portions; wherein the length of the medial portion is less thanthe length of the proximal portion.
 19. The particle accelerator ofclaim 11, wherein at least one of the plurality of accelerating cellscomprises a nose.
 20. The particle accelerator of claim 19, wherein thenose comprises an increased thickness of a portion of the jointstructure between neighboring cells of the first plurality of cells, theincreased thickness being relative to one or more regions surroundingthe nose of the portion of the joint structure.